@article{oai:jissen.repo.nii.ac.jp:00001017,
 author = {鎌田, 佳伸 and 森島, 玲子 and 亘, 麻希 and 江端, 美和 and 関, 伸一郎 and カマタ, ヨシノブ and モリシマ, レイコ and ワタリ, マキ and エバタ, ヨシカズ and セキ, シンイチロウ and Kamata, Yoshinobu and Morishima, Reiko and Watari, Maki and Ebata, Yoshikazu and Seki, Shinichiro},
 journal = {実践女子大学生活科学部紀要},
 month = {Mar},
 note = {P(論文), The relationship of embroidery thread structure with gloss, and the relationship of embroidery method with gloss were investigated using a home-use embroidery machine. It was suggested that greater gloss required the use of smooth and uniform embroidery thread with low twist. With satin stitching, although gloss was high along the direction of thread axis, it dropped dramatically as the angle to the thread axis was increased to about 60° then showed fairly little change thereafter until 90°. Although these tendencies were similar with tatami stitching as well, the level of gloss was lower in general than with satin stitching and showed little change. With tatami stitching, gloss increased as the stitch length was made longer. Gloss increased dramatically as stitch length approached 4 mm, with only moderate increase shown thereafter. When measured at the point of specular reflection, or where the angle of incidence matches the angle of acceptance, the highest level of glossiness was shown at about 45° to the incidence/acceptance angle.},
 pages = {117--123},
 title = {ミシン刺繍の光沢に与える刺繍糸の影響},
 volume = {46},
 year = {2009}
}